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REPORT: Directed Molecular Assembly of Block Copolymers & Graphitic Carbons
Oct 23, 2014

Topic:Directed Molecular Assembly of Block Copolymers & Graphitic Carbons
Speaker:Professor Sang Ouk Kim
               Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS)
               Department of Materials Science and Engineering,
               KAIST Daejeon 305-701,Republic of Korea

Time:2014/10/23 15:00(Thursday)

Molecular self-assembly is a genuine principle that can generate complex, ultrafine nanoscale structures in a highly efficient manner. Unlike other nanofabrication process that frequently relies on the serial writing of desired structures, self-assembly enables parallel processing scalable to cost effective mass-production. Meanwhile, the molecular interactions involved with molecular self-assembly are generally relying on weak forces, such as van der Waals force, hydrogen bonding, and hydrophobic interaction. Accordingly, self-assembly frequently suffers from a high density of defect formation and retarded assembly kinetics. Any attempt to exploit self-assembly principle for nanofabrication must address the defect minimization and the acceleration of assembly kinetics to accomplish the ultimate processing for large scale production. To this end, directed self-assembly that employs prepatterned structure or electric/magnetic/shear field for highly ordered nanostructure has emerged. In this presentation, our research achievements for the directed molecular assembly of various soft materials and low-dimensional nanomaterials will be introduced. Block copolymer self-assembly can be synergistically integrated with conventional ArF or I-line photolithography for sub-10-nm scale nanopatterning. Carbon nanotubes and graphene can be assembled into many different two- or three-dimensional morphologies maintaining their high electrical conductivity and extremely large surface area. Relevant application fields of the molecular scale assembled structures will be also demonstrated.

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