Topic：Directed Molecular Assembly of Block Copolymers & Graphitic Carbons
Speaker：Professor Sang Ouk Kim
               Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS)
               Department of Materials Science and Engineering,
               KAIST Daejeon 305-701,Republic of Korea

Time：2014/10/23 15:00（Thursday）
Room：无机-超分子楼二楼圆形报告厅

Abstract：
Molecular self-assembly is a genuine principle that can generate complex, ultrafine nanoscale structures in a highly efficient manner. Unlike other nanofabrication process that frequently relies on the serial writing of desired structures, self-assembly enables parallel processing scalable to cost effective mass-production. Meanwhile, the molecular interactions involved with molecular self-assembly are generally relying on weak forces, such as van der Waals force, hydrogen bonding, and hydrophobic interaction. Accordingly, self-assembly frequently suffers from a high density of defect formation and retarded assembly kinetics. Any attempt to exploit self-assembly principle for nanofabrication must address the defect minimization and the acceleration of assembly kinetics to accomplish the ultimate processing for large scale production. To this end, directed self-assembly that employs prepatterned structure or electric/magnetic/shear field for highly ordered nanostructure has emerged. In this presentation, our research achievements for the directed molecular assembly of various soft materials and low-dimensional nanomaterials will be introduced. Block copolymer self-assembly can be synergistically integrated with conventional ArF or I-line photolithography for sub-10-nm scale nanopatterning. Carbon nanotubes and graphene can be assembled into many different two- or three-dimensional morphologies maintaining their high electrical conductivity and extremely large surface area. Relevant application fields of the molecular scale assembled structures will be also demonstrated.

References
1. S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, P. F. Nealey Nature 424, 411 (2003).
2. M. P. Stoykovich, M. Muller, S. O. Kim, H. H. Solak, E. W. Edwards, J. J. de Pablo, P F. Nealey Science 308, 1442 (2005).
3. S.-J. Jeong, J. Y. Kim, B. H. Kim, H. S. Moon, S. O. Kim Materials Today (Invited Review) 16, 468 (2013).
4. S. H. Lee, D. H. Lee, W. J. Lee, S. O. Kim Advanced Functional Materials (Invited Feature Article) 21, 1338 (2011).
5. U. N. Maiti, W. J. Lee, J. M. Lee, Y. T. Oh, J. Y. Kim, J. E. Kim, J. W. Shim, T. H. Han, S. O. Kim Advanced Materials (Invited Review for journal 25th Anniversary) 26, 40 (2014).

Welcome!